Prolith Software

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Scientific simulation software is used to simulate scientific phenomina based on a scientific model. This category has the following 3 subcategories, out of 3 total. Navigate to the InstallPath Prolith.exe file, where InstallPath is the directory in which you installed PROLITH. The default installation directory is C: Program Files KLA-Tencor PROLITH 11.0. In the Available References list, select the Prolith check box and then click OK. KLA-Tencor will add Finle's tools, specifically its Prolith software, to the equipmentvendor's PMC-Net (process module control network).

Systems Modeling

The fabrication of an integrated circuit requires a variety of physical and chemicalprocesses to be performed on a semiconductor substrate. In general, these processesfall into three categories: film deposition, patterning, and semiconductor doping.Films of both conductors and insulators are used to connect and isolate transistorsand their components.By creating structures of these various components millionsof transistors can be built and wired together to form the complex circuitry of modernmicroelectronic devices. Mack developed the lithography simulation software PROLITH, andfounded and ran the company FINLE Technologies fro ten years.

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He then served as VicePresident of Lithography Technology for KLA-Tencor for five years, until 2005. In2003 he received the SEMI Award for North America for his efforts in lithography simulationand education. He is also an adjunct faculty member at the University of Texas atAustin. Currently, he writes, teaches, and consults on the field of semiconductormicrolithography in Austin, Texas.

Science Applications International Corporation

AdvertisementPROLITH 13.2 DescriptionPROLITH lithography simulation tool uses advanced models to quickly and accurately simulate how pattern will print on the wafer for 2Xnm and below design nodes.PROLITH lithography simulation tool uses advanced models to quickly and accurately simulate how pattern will print on the wafer for 2Xnm and below design nodes. This computational lithography tool is used by advanced IC manufacturers, stepper companies, track companies, mask manufacturers, material providers and research consortia to cost-effectively evaluate EUV, double patterning and other advanced lithography technologies.OS: Windows.